E2F Series Resin-case Proximity Sensor

E3F3-R36M detection methods: Regression reflection type,
Lead extraction: CN M12,
Type: metal appearance; PNP output,
Threaded cylindrical photoelectric sensor, built-in amplifier,
Photoelectric sensor with proximity sensor appearance
High anti interference with optoelectronic -IC technologySensing method: Through-beam (Emitter + Receiver) E2F Series.
Connection method: Standard M8 connector.
Sensing distance: 10 m E2F Series
Model: PNP output .
The Standard for Photoelectric Sensors,
with a Secure Track Record of One,
Million Sold Yearly.
Long sensing distance of 30 m for Through-beam Models, 4 m for,
Retro-reflective Models, and 1 m for Diffuse-reflective Models.
Mechanical axis and optical axis offset of less than ±2 E2F Series. 5° simplifies,
optical axis adjustment.
High stability with unique algorithm that prevents interference of,
external light. Sensing method: Distance settable.
Connection method: Connector (M8, 4 pins).
Model: NPN output.
Distance-settable Sensor Unaffected,
by Workpiece Color and Background.
Distance-settable triangulation model unaffected by color.
Simple positioning settings using a clear LED spot E2F Series.
(E3Z-LS@3/LS@8).
Detect minute steps. Detection methods: the firing pattern.
Detection range: 2m.
Purpose: small,
Small thin space probe;
Interference prevention function with close installationAppearance: Unshielded.
Sensing surface: Top.
Sensing distance: 2.5 mm.
Output configuration: PNP.
Model: Operation mode, NC.
Advanced Performance and Wide.
Range of Selections in a Super.
compact Size.
Only 5.5 × 5.5 mm with a built-in Amplifier.
Maximum sensing distance: 2.5 mm. Stable detection even with,
workpiece fluctuations.
Response frequency: 1 kHz.
Low current consumption. Sensing method: Diffuse-reflective.
Connection method: Pre-wired (2 m).
Sensing distance: 1 m.
Model: NPN output .
The Standard for Photoellectric Sensors,
with a Secure Track Record of One,
Million Sold Yearly E2F Series.
Long sensing distance of 30 m for Through-beam Models, 4 m for,
Retro-reflective Models, and 1 m for Diffuse-reflective Models.
Mechanical axis and optical axiss offset of less than ±2 E2F Series. 5° simplifies,
optical axis adjustment.
High stability with unique algorithm that prevents interference of,
external light.